Course Content

• Introduction to MOSFET evolution and TCAD
• Basics of transistor operation
• Basics of transistor fabrication technology for manufacturing
• Unit processes & process integration
• 28nm CMOS transistor fabrication and operation
• Process and device challenges at 28 nm node such as source/drain epitaxial stressors for enhanced mobility, high-K dielectrics, and metal gate stacks, challenges of lithography, etching, and deposition at 28 nm node
• TCAD simulations based lab for process and device technology at 28 nm node